Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

摘要

A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.;

主权项

1. A pattern forming method, comprising:
(i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern: wherein Xa represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; each of Ry1 to Ry3 independently represents an alkyl group or a cycloalkyl group, and two members out of Ry1 to Ry3 may combine to form a ring; Z represents a (n+1)-valent linking group having a polycyclic hydrocarbon structure which may have a heteroatom as a ring member, provided that Z does not contain an ester bond as an atomic group constituting the polycyclic ring; L1 represents a single bond or a divalent linking group; L2 represents a single bond; n represents an integer of 1 to 3; when n is 2 or 3, a plurality of L2's, a plurality of Ry1's, a plurality of Ry2's and a plurality of Ry3's may be the same as or different, respectively; the content of the repeating unit (a1) is 60 mol % or more based on all repeating units in the resin (P); the number of carboxyl groups remaining in a polymer generated by decomposition of the repeating unit (a1) represented by formula (I) due to action of an acid is 1; and the step of performing the development includes only development performed by using the developer containing the organic solvent.