EXPOSURE APPARATUS, METHOD OF CLEANING MEMBER THEREOF, MAINTENANCE METHOD OF EXPOSURE APPARATUS, MAINTENANCE DEVICE, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of preventing deterioration in exposure accuracy and measurement accuracy due to contamination of a member contacting a liquid in a liquid immersion region.

SOLUTION: The exposure apparatus EXS forms the liquid immersion region AR2 of a liquid LQ on the image face side of a projection optical system PL, and exposes a board P via the projection optical system PL and the liquid LQ of the liquid immersion region AR2. The exposure apparatus EXS is provided with an optical cleaning device 80 for irradiating the upper surface 31 etc. of a substrate stage PST in contact with the liquid LQ for forming the liquid immersion region AR2 with a predetermined irradiation light Lu having an optical cleaning effect.

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