| 摘要 |
<p>PROBLEM TO BE SOLVED: To accurately detect a defect in the pattern of a contact hole or a line space. SOLUTION: In this method, the defect of a pattern being formed on a sample is detected. The method is provided with a process 11 for inputting the optical image of the sample as sensor data, a process 12 for inputting reference data corresponding to the sensor data, a process 13 for inputting inspection region data for setting a rectangular region R including one opening part as an inspection region and specifying a plurality of the inspection regions, a process 30 for picking out the sensor data being included in the region and the reference data corresponding to the sensor data and for calculating a transmittance error and a relative offset of position based on the data, and a process 40 for judging a transmittance defect, a dimensional defect, and a relative position offset defect according to the obtained transmittance error and relative position offset.</p> |
