| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment capable of suppressing the degradation of performance of a liquid supply system. <P>SOLUTION: This exposure equipment comprises a first power source and is operated by the power supplied from the first power source, and irradiates a substrate with exposure light to expose the substrate to the light. This exposure equipment comprises the liquid supply system having a supply passage for supplying the liquid, and power is supplied to the liquid supply system from a second power source upon the first power source anomaly. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
