| 摘要 |
PURPOSE:To prevent interference from occurring and to eliminate the cause of retention by making the thickness of a sealing member facing to the side of the developing area of a developing sleeve thin so that a gap between the sealing member and the surface of the developing sleeve becomes large. CONSTITUTION:The sealing member K1 is divided to an entrance sealing part K1A covering the developing area and a side sealing part K1B covering the side of the developing area. The thickness (alpha) of the sealing part K1A is made thick to some extent so that the part K1A is deflected and deformed when it is closely brought into contact with a photosensitive body. Besides, by closely bringing it into contact with the photosensitive body, developer is prevented from being splashed toward the photosensitive body. On the other hand, with respect to the sealing part K1A, the thickness of the side sealing part K1B is set to be the same thickness (alpha) as the sealing part K1A within a range that it is extended by the same length as the tip of the sealing part K1A and the thickness (beta) of the range from a position corresponding to the tip of the sealing part K1A to the tip of the sealing part K1B is thinned. Then, the gap between the sealing member K1 and the surface of the developing sleeve B at the side sealing part K1B is made large. Thus, the developer is not retained at the gap of the sealing member K1. |
