| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sprayed coating having excellent plasma etching resistance to low output plasma in which plasma output applied to a sprayed coating per unit area is <0.8 W/cm<SP>2</SP>. <P>SOLUTION: The sprayed coating at least comprises yttria as the main component. When the sprayed coating is exposed to CF<SB>4</SB>plasma in which plasma output applied to the sprayed coating per unit area is <0.8 W/cm<SP>2</SP>, the etching rate of the sprayed coating by the CF<SB>4</SB>plasma satisfies the inequality of Re≤8.0×Pp<SP>2.2</SP>; wherein, Re denotes the etching rate [nm/min] of the sprayed coating by the CF<SB>4</SB>plasma; and Pp denotes the plasma output [W/cm<SP>2</SP>] applied to the sprayed coating per unit area. <P>COPYRIGHT: (C)2007,JPO&INPIT |
