| 摘要 |
<p>A processing device capable of being maintained easily and reducing a burden on a worker and a method of maintaining the processing device; the processing device, comprising an upper electrode unit (106) forming the ceiling part of a processing chamber (102) of an etching device (100) having a lower assembly (128) on the processing chamber (102) side including upper electrodes (130) and an upper assembly (126) on a power supply side including an electro-body (144); the method of maintaining the processing device, comprising the steps of releasing a lock mechanism (156), solely raising the upper assembly (126) by a lift mechanism (164) for removal, and performing the maintenance of the upper assembly (126) and/or the lower assembly (128), and then locking the lock mechanism (156), raising the upper and lower assemblies (126, 128) integrally with each other by the lift mechanism (164) for removal, and performing the maintenance of the internal parts in the processing chamber (102).</p> |
