| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing device capable of correcting the disturbance of a pit pattern shape affected by a proximity effect between adjoining tracks. SOLUTION: The drawing device draws a pit pattern on a resist film on the surface of a substrate by irradiating the substrate fast rotating at a predetermined speed with an electron beam. The device varies the relative moving speed of the electron beam with respect to the resist film, as shown in Fig.(a) in the figure, depending on an amount corresponding to latent images in at least one adjoining track (for example, a track on the left side or a track on the right side of the center track) to the track (for example, the center track) where the pit pattern is drawn, and deflects the electron beam in a direction along the track, while the device adjusts the drawing period of the pit pattern so as to prevent changes in the pit pattern feature due to the difference in the relative moving speed of the electron beam with respect to the resist film caused by the deflection. COPYRIGHT: (C)2009,JPO&INPIT
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