| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vaporization device which operates with high vaporizing efficiency and in which pressure variations are decreased, thereby improve the yield of wafer by enhancing the accuracy of results. SOLUTION: The valve structure for vaporization device is provided with a valve seat 16 which fronts on a vaporization area (b) where liquid material 106 vaporizes and on which a liquid material supply port 15a for supplying the liquid material 106 to the vaporization area (b), is provided, and a valve element 1 capable of controlling the opening of a passage which abuts on and separates from the valve seat 16 to extend from the liquid material supply port 15a to the vaporization area (b) when the passage is opened and closed, and closed. Thus, the valve structure can control the flow rate of the liquid material 106 flowing out from the passage to the vaporization area (b).</p> |
