发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus comprising an illumination system (IL) for providing a projection beam of radiation (PB), a support structure (MT) for supporting patterning means (MA), the patterning means (MA) serving to impart the projection beam (PB) with a pattern in its cross-section. The apparatus further comprises a substrate table (WT) for holding a substrate (W), a projection system (PL) for projecting the patterned beam onto a target portion of the substrate (W), and a collector (1; 101; 201) which is arranged for transmitting radiation (R), received from a first radiation source (SO), to the illumination system (IL). The apparatus comprises at least a heater (2; 102; 202) for heating the collector (1; 101; 201) when the collector receives substantially no radiation from the first radiation source (SO). <??>The invention further provides a device manufacturing method as well as a device manufactured thereby. <IMAGE> |
申请公布号 |
EP1555575(A1) |
申请公布日期 |
2005.07.20 |
申请号 |
EP20050075105 |
申请日期 |
2005.01.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MOORS, J.H.J.;FRANKEN, J.C.L.;MICKAN, UWE;VOORMA, HARM-JAN |
分类号 |
G02B17/00;G03F7/20;H01L21/027 |
主分类号 |
G02B17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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