| 摘要 |
PROBLEM TO BE SOLVED: To provide a clean and non-contact substrate cleaning technology with a shortened apparatus line by combining a surfactant with superheated steam, without using a technology or an device such as chemical solution, eximer UV, AP plasma, ultrasonic wave, brushing or high pressure water, in substrate cleaning. SOLUTION: In this cleaning method, surfactant solution is sprayed over the substrate with a shower nozzle, then superheated steam is jetted from a steam nozzle, to remove organic matter by heated surfactant solution and an implosion phenomenon of steam. Particles are removed by a phreatic explosion phenomenon by spraying fine atomized water over the substrate immediately below the steam, washed matter is discharged and carried out by a washing nozzle, watermark is prevented by covering the substrate front face with the atomized water, and the substrate is dried by an air nozzle. COPYRIGHT: (C)2007,JPO&INPIT
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