发明名称 Electronic device insulating layer material capable of forming an insulating layer at low temperature
摘要 Insulating layer material comprising: polymer compound of a repeating unit containing a cyclic ether structure and a repeating unit of the formula:;wherein R5 represents a hydrogen atom or a methyl group; Rb b represents a linking moiety which links the main chain of the polymer compound with a side chain of the polymer compound and optionally has a fluorine atom; R represents an organic group capable of being detached by an acid; R′ represents a hydrogen atom or a monovalent organic group having from 1 to 20 carbon atoms and optionally having a fluorine atom; the suffix b represents an integer of 0 or 1, and the suffix n represents an integer of from 1 to 5; when there are two or more Rs, they may be the same or different; and when there are two or more R's, they may be the same or different; and tungsten (V) alkoxide.
申请公布号 US9362512(B2) 申请公布日期 2016.06.07
申请号 US201214364376 申请日期 2012.12.12
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 Yahagi Isao
分类号 H01L51/40;H01L51/05;H01B3/44 主分类号 H01L51/40
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An electronic device insulating layer material comprising: a polymer compound (A) which contains a repeating unit containing a cyclic ether structure and a repeating unit represented by the formula (1): wherein R5 represents a hydrogen atom or a methyl group; Rbb represents a linking moiety which links the main chain of the polymer compound with a side chain of the polymer compound and optionally has a fluorine atom; R represents an organic group capable of being detached by an acid; R′ represents a hydrogen atom or a monovalent organic group having from 1 to 20 carbon atoms and optionally having a fluorine atom; the suffix b represents an integer of 0 or 1, and the suffix n represents an integer of from 1 to 5; when there are two or more Rs, they may be the same or different; and when there are two or more R′s, they may be the same or different; and tungsten (V) alkoxide (B).
地址 Tokyo JP