DIFFRACTION GRATING, MANUFACTURING METHOD FOR DIFFRACTION GRATING, EXPOSURE METHOD USING SAME DIFFRACTION GRATING, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, AND EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an exposure method which is suitably used to form a fine pattern constituting an electronic device, the exposure method having high resolution and being inexpensive.

SOLUTION: Two diffraction gratings are arranged in an optical path in series and at a designated interval with a wafer etc., constituting the electronic device, and the wafer etc., is exposed to a light-dark pattern of interference fringes formed by the diffraction gratings. The exposure is carried out while the position relation between the semiconductor wafer and diffraction gratings is changed at need. Each diffraction grating has a plurality of rectangular reflecting members arrayed in designated cycles nearby the surface of a light-transmissive flat plate and the relation between the width and height, etc., is optimized.

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