| 摘要 |
PROBLEM TO BE SOLVED: To provide a process chamber and coating installation which each ensure simple transport as well as secure and reliable contacting with the substrate carriers in a reaction chamber. SOLUTION: A process chamber 1 for PECVD (Plasma Enhanced Chemical Vapor Deposition) coating of a substrate 5a comprises a recipient 2, treatment tools for generating the reaction conditions for the treatment of the substrate, carriers 4a, 4b for carrying the substrate; and a transport device for transporting the carrier into the recipient or from the recipient along a transport route defined by the movement the carrier, wherein the transport device has at least one guidance device for guiding the carrier. Furthermore, the process chamber comprises means for uncoupling a carrier positioned in a transport position from the guidance device, and means for the acceptance of the carrier from the guidance device, wherein the means for acceptance comprise a transfer device for transferring the carrier from the transport position into a treatment position transverse to the transport direction. COPYRIGHT: (C)2008,JPO&INPIT
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