Method for emitting radiation for use in lithographic projection apparatus,申请号EP20000311177-传众专利搜索

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发明名称	Method for emitting radiation for use in lithographic projection apparatus
摘要
申请公布号	EP1109427(B1)	申请公布日期	2009.11.25
申请号	EP20000311177	申请日期	2000.12.14
申请人	ASML NETHERLANDS B.V.	发明人	FIEDOROWICZ, HENRYK;BIJKERK, FREDERIK;DE BRUIJN, CORNELIS CORNELIA;BARTNIK, ANDRZEJ;KOSHELEV, KONSTANTIN NIKOLAEVITCH;BANINE, VADIM YEVGENYEVITCH
分类号	H01L21/027;H05G2/00;G03F7/20	主分类号	H01L21/027
代理机构		代理人
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