| 发明名称 |
Apparatus and method to control ion beam current |
| 摘要 |
An apparatus to control an ion beam for treating a substrate. The apparatus may include a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam, a ground electrode assembly disposed downstream of the fixed electrode. The ground electrode assembly may include a base and a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position. |
| 申请公布号 |
US9396903(B1) |
申请公布日期 |
2016.07.19 |
| 申请号 |
US201514615602 |
申请日期 |
2015.02.06 |
| 申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Chang Shengwu;Rounds Kristen S.;Leavitt William;St. Peter Michael |
| 分类号 |
C23C14/48;G21K1/08;H01J37/317;H01J37/08;H01J37/10 |
主分类号 |
C23C14/48 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus to control an ion beam for treating a substrate, comprising:
a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam; a ground electrode assembly disposed downstream of the fixed electrode, the ground electrode assembly comprising: a base; and a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position. |
| 地址 |
Gloucester MA US |
