发明名称 |
Photosensitive polymers and photoresist compositions containing the same |
摘要 |
Photosensitive polymers are represented by the formula: <IMAGE> wherein R1 is selected from the group consisting of hydrogen and methyl; R2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms; R3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9. Photoresist compositions comprise the photosensitive polymers and photoacid generators.
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申请公布号 |
US5851727(A) |
申请公布日期 |
1998.12.22 |
申请号 |
US19970866807 |
申请日期 |
1997.05.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, SANG-JUN;PARK, CHUN-GEUN;KOH, YOUNG-BUM |
分类号 |
C07C69/00;C08F220/26;C08F220/30;G03F7/004;G03F7/033;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
C07C69/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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