发明名称 |
Device manufacture involving lithographic processing |
摘要 |
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.
|
申请公布号 |
USRE36964(E) |
申请公布日期 |
2000.11.21 |
申请号 |
US19940236742 |
申请日期 |
1994.04.29 |
申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
BERGER, STEVEN DAVID;GIBSON, JOHN MURRAY |
分类号 |
G03F1/16;G03F7/20;H01J37/317;H01L21/027;H01L21/30;(IPC1-7):B05D5/12;B05D3/06;B05D3/04 |
主分类号 |
G03F1/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|