| 摘要 |
The objective of the present invention is to provide: a gas barrier film having excellent gas barrier properties, productivity and optical characteristics; and the like. This gas barrier film comprises, on a resin base, a gas barrier layer in which a first layer and a second layer formed in contact with the first layer are laminated. This gas barrier film is characterized in that: the first layer contains silicon (Si); the second layer contains a transition metal M; and the second layer has a thickness of 15 nm or less. |
