发明名称 Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method
摘要 Information of oscillation frequency of a laser beam source in a predetermined range including usable oscillation frequency that takes into consideration an output quality of the laser beam source, such as information on a relationship between oscillation frequency and output quality, is stored in a memory. Then, when the laser beam source is controlled, based on the information stored in the memory, a particular frequency range where the output quality of the laser beam source deteriorates or becomes good is specified, and a decision is made whether or not oscillation frequency f, which is going be used, is within the particular frequency range. Then, according to the results, the oscillation frequency is set, avoiding a frequency range where the output quality deteriorates or within a frequency range where the output quality becomes good according to the result. Thus, a laser beam source whose output quality is always good can be used.
申请公布号 US7154922(B2) 申请公布日期 2006.12.26
申请号 US20030464510 申请日期 2003.06.19
申请人 NIKON CORPORATION 发明人 HATTORI OSAMU
分类号 H01L21/027;H01S3/13;G03F7/20;H01S3/131 主分类号 H01L21/027
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