| 摘要 |
PURPOSE: A connecting structure of a diaphragm valve of a process chamber is provided to exchange easily the diaphragm valve by improving a connecting structure of the diaphragm valve. CONSTITUTION: A process chamber is used for performing a semiconductor fabrication process. A bottom electrode is installed in the inside of the process chamber. A helium gas is provided to a gas supply system in order to prevent the overheat of the bottom electrode when the semiconductor fabrication process is performed. The gas supply system includes a plurality of diaphragms(18), a passive valve, a pressure gauge, and a flow register. A gas line(30) connected to the process chamber and a connection part connected to a front line(32) are connected to each other by a bolt connection structure(18a,18b).
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