| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition in which an addition amount of an acid generator can be significantly decreased while maintaining resist performance at a high level.SOLUTION: The resist composition comprises a solid component containing a resist base material, and a solvent, in which the solid component and the solvent are included by 1 to 80 mass% and 20 to 99 mass%, respectively. The resist base material comprises a cyclic compound (M) having a specific structure and a specific cyclic compound (S); a percentage of M in the resist base material is 65 to 99 mass%; and a mass ratio of S to M is 0.01 to 0.10.SELECTED DRAWING: None |
