发明名称 |
PLASMA GENERATOR AND FILM FORMING METHOD EMPLOYING SAME |
摘要 |
<p>PROBLEM: To generate long plasma easily at low cost and to perform a plurality of film deposition methods using a single plasma generating device. MEANS FOR SOLVING THE PROBLEM A plasma generating device is provided with, in the vacuum inside thereof, a cylindrical electrode comprising an opening in a part thereof and generating plasma therein when gas is introduced thereinto and a direct-current negative voltage is applied thereto.</p> |
申请公布号 |
EP1912483(A1) |
申请公布日期 |
2008.04.16 |
申请号 |
EP20060781987 |
申请日期 |
2006.07.31 |
申请人 |
DIALIGHT JAPAN CO., LTD. |
发明人 |
JIANG, NAN;WANG, HONG-XING;HIRAKI, AKIO;HABA, MASANORI |
分类号 |
H05H1/24;C01B31/02;C23C14/06;C23C16/509;H01J37/32;H05H1/46 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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