发明名称 COATING LIQUID FOR DOPANT DIFFUSION, AND METHOD OF PRODUCING SEMICONDUCTOR USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a coating liquid for dopant diffusion which allows for uniform coating on a mirror surface while enhancing the measurement accuracy of lifetime measurement, and improves productivity in semiconductor production, and to provide a method of producing semiconductor using the same.SOLUTION: A coating liquid for dopant diffusion principally containing (meth)acrylic acid ester-based resin (A) having a structural unit derived from (meth)acrylic acid ester monomer, where the carboxylic acid ester group in the (meth)acrylic acid ester monomer is a 3C-10C carboxylic acid ester group, a dopant (B) and a solvent (C) is used.SELECTED DRAWING: None
申请公布号 JP2016115744(A) 申请公布日期 2016.06.23
申请号 JP20140251701 申请日期 2014.12.12
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE 发明人 TSUTSUMI YUKA;SATO HIROAKI;KATSUMA KATSUHIKO
分类号 H01L21/225;C08K3/38;C08K5/55;C08L33/04 主分类号 H01L21/225
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