| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material having few planar faults, preventing light fogging due to a color former, ensuring few breaks in the unexposed film, having high resolution, high tent film strength and good peelability after pattern formation, and forming a higher-definition pattern, and also to provide a pattern forming apparatus equipped with the pattern forming material, and a pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material has a photosensitive layer comprising a binder, a polymerizable compound, a photopolymerization initiator, a hetero condensed ring system compound, a polymerization inhibitor, a color former, and an organic solvent. The binder has an acid number of 50-400 mgKOH/g and a mass average molecular weight of 10,000-100,000, the polymerizable compound contains at least one of a compound having a urethane group and a compound having an aryl group, the organic solvent is at least one selected from ketones, alcohols and ethers, and the content of the organic solvent is ≤0.5 mass%. <P>COPYRIGHT: (C)2007,JPO&INPIT |
