发明名称 Non-volatile memory cell devices and methods, having a storage cell with two sidewall bit cells
摘要 Non-volatile memory cells and methods. In an apparatus, an array of non-volatile storage cells formed in a portion of a semiconductor substrate includes a first storage cell having a first bit cell and a second bit cell; a second storage cell having a third bit cell and a fourth bit cell; and a column multiplexer coupled to a plurality of column lines, selected ones of the column lines coupled to a first source/drain terminal of the first and the second storage cell and coupled to a second source/drain terminal of the first and second storage cell, the column multiplexer coupling a voltage to one of the column lines connected to the first storage cell corresponding to the data, and coupling a voltage to one of the column lines connected to the second storage cell corresponding to the complementary data.
申请公布号 US9390799(B2) 申请公布日期 2016.07.12
申请号 US201213460487 申请日期 2012.04.30
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chih Yue-Der
分类号 G11C16/04;G11C11/56;H01L29/70;H01L29/40;H01L29/423;H01L29/792 主分类号 G11C16/04
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. An apparatus, comprising: an array of non-volatile storage cells formed in a portion of a semiconductor substrate, comprising: a first storage cell having a first bit cell for storing trapped charges corresponding to a first data bit and a second bit cell for storing trapped charge corresponding to a second data bit, the first data bit and the second data bit being representative of different data bits;a second storage cell having a third bit cell for storing trapped charges corresponding to a third data bit and a fourth bit cell for storing trapped charge corresponding to a fourth data bit, the third data bit and the fourth data bit being representative of different data bits, the third data bit being a complementary data bit to the first data bit, the first and second storage cells comprising a first MOS transistor and a second MOS transistor, respectively, the first and second bit cells comprising first sidewall storage cells adjoining sidewalls of a first gate of the first MOS transistor, the third and fourth bit cells comprising second sidewall storage cells adjoining sidewalls of a second gate of the second MOS transistor, the first sidewall storage cells comprising first oxide-nitride-oxide layers adjoining sidewalls of the first gate, at least an oxide portion of the first oxide-nitride-oxide layers being a single continuous layer extending across a top surface from one sidewall to an opposite sidewall of the first gate of the first MOS transistor, the second sidewall storage cells comprising second oxide-nitride-oxide layers adjoining sidewalls of the second gate, at least an oxide portion of the second oxide-nitride-oxide layers being a single continuous layer extending across a top surface from one sidewall to an opposite sidewall of the second gate of the second MOS transistor;a word line coupled to supply voltages to gate terminals of the first and second storage cells; anda column multiplexer coupled to a plurality of column lines, a first column line coupled to a first source/drain terminal of the first storage cell and a second column line coupled to a first source/drain terminal of the second storage cell, the column multiplexer coupled to receive data and complementary data for storage in the non-volatile storage cells, the column multiplexer coupling a voltage to the first column line corresponding to the data, and coupling a voltage to the second column line corresponding to the complementary data.
地址 Hsin-Chu TW