发明名称 INK COMPOSITION, INK JET RECORDING METHOD, METHOD FOR PRODUCING LITHOGRAPHIC PLATE AND THE LITHOGRAPHIC PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an ink composition curable in high sensitivity to irradiation of radioactive rays, able to form high quality images and giving a cured product prepared by curing the ink and having sufficient flexibility, a method of ink jet recording using the same, a lithographic plate able to form high quality images prepared by the ink composition and excellent in printing resistance and a method for producing the same. <P>SOLUTION: The ink composition comprises (A) a polymerization initiator, (B-1) at least one compound selected from (meth)acrylic acid, monofunctional (meth)acrylic acid esters having a carboxyl group in the molecule and monofunctional (meth)acrylic acid esters having a hydroxyl group in the molecule and (B-2) a polymerizable compound having an amide structure in the molecule and preferably contains (D) a colorant and (E) a sensitizing pigment. The ink composition is suitable for ink jet recording. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007112844(A) 申请公布日期 2007.05.10
申请号 JP20050303280 申请日期 2005.10.18
申请人 FUJIFILM CORP 发明人 NAKAMURA IPPEI
分类号 B41J2/01;B41M5/00;C09D11/00;C09D11/322;C09D11/328;C09D11/38 主分类号 B41J2/01
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