发明名称 |
APPARATUS FOR DETECTING POSITION OF SUBSTRATE, ELLIPSOMETER, AND FILM THICKNESS MEASURING APPARATUS |
摘要 |
In an apparatus for detecting a position of a substrate in a film thickness measuring apparatus, an image pickup area on a substrate by an image pickup device of an imaging part is rotated by a rotation mechanism of a position detecting part. With this operation, an image of an edge of the substrate can be easily picked up at a plurality of image pickup positions around a central axis to detect a position of the substrate, without providing a mechanism for rotating a stage holding the substrate. As a result, it is possible to suppress upsizing of a structure for detecting a position of the substrate in the film thickness measuring apparatus and to achieve high-speed and high precision-position detection of the substrate, as compared with a conventional apparatus where a mechanism for rotating a substrate is provided above a mechanism for moving the substrate in a horizontal direction.
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申请公布号 |
US2009059229(A1) |
申请公布日期 |
2009.03.05 |
申请号 |
US20080197728 |
申请日期 |
2008.08.25 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
FUKUE KUMIKO |
分类号 |
G01N21/21;G01B11/00;G01B11/06 |
主分类号 |
G01N21/21 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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