发明名称 Verfahren zur Herstellung von dotierten Halbleitergebieten in einem Halbleiterkörper eines lateralen Trenchtransistors
摘要 Lateral trench transistor (200) has a body region (4) inside which a semiconductor region (10) is provided adjoining to it. The semiconductor region is electrically connected with the source contact (12) and its type of endowment corresponds to the type of endowment of body region. An independent claim is also included for a method for manufacturing of endowed semiconductor region.
申请公布号 DE102004063991(B4) 申请公布日期 2009.06.18
申请号 DE20041063991 申请日期 2004.10.29
申请人 INFINEON TECHNOLOGIES AG 发明人 HIRLER, FRANZ;WAHL, UWE;MEYER, THORSTEN;RUEB, MICHAEL;WILLMEROTH, ARMIN;SCHMITT, MARKUS;TOLKSDORF, CAROLIN;SCHAEFFER, CARSTEN
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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