| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a resist pattern of a satisfactory profile on a reflection preventing film, by preventing generation of a void a reflection preventing film phenol resin is heated at a high temperature. SOLUTION: A method includes a process for forming a reflection preventing film 2 including phenol system resin and a compound acting as plastic agent on embedded agent or the phenol system resin, process for heating a reflection preventing film 2 and making dense the reflection preventing film 2, and process for forming a resist pattern 8 on the dense reflection preventing film. |
