| 摘要 |
PROBLEM TO BE SOLVED: To provide a two-fluid nozzle for reducing damage to a substrate while efficiently cleaning the substrate, and to provide a substrate cleaning device and method using the same. SOLUTION: The two-fluid nozzle 301 has a liquid discharge port 327 opening in an annular and slit shape and having an opening area set to be 1.8-36 mm<SP>2</SP>. It therefore supplies a greater number of liquid droplets per unit time than a conventional nozzle, and practically and efficiently cleans the substrate W. The liquid discharge port 327 has a slit width set to be 0.1-1.0 mm to suppress the formation of liquid droplets having relatively larger sizes which contribute to damaging the substrate W. Thus, the nozzle 301 reduces damage to the substrate W while efficiently cleaning the substrate W. COPYRIGHT: (C)2009,JPO&INPIT
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