METHOD FOR MANUFACTURING SUBSTANTIALLY NON-PHOTOSENSITIVE ORGANIC SILVER SALT PARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a substantially non-photosensitive organic silver salt particle containing silver behenate.

SOLUTION: The method for manufacturing the substantially non-photosensitive organic silver salt particle containing silver behenate comprises (i) manufacturing a solution or a dispersion A comprising an alkali metal or ammonium salt of an organic compound with an at least one acidic hydrogen atom and comprising behenic acid in a mixture of water and an organic solvent at a temperature where the substantially non-photosensitive organic silver salt particle containing silver behenate is not reduced, and (ii) a step for incorporating a certain amount of a water solution B of a silver salt containing silver ions with an equal number to alkali or ammonium ions in the solution or the dispersion A. The method is characterized in that the number of initial mixing of the water solution B incorporated into the solution or the dispersion A is larger than or equal to 2×10-4in manufacturing the particle of the substantially non-photosensitive organic silver salt containing silver behenate, and the number of initial mixing is a ratio of the molar speed of feeding the silver salt to the solution A in a reactor to the molar speed of circulating the alkali or ammonium salt in the reactor.

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