发明名称 Gas distribution apparatus for directional and proportional delivery of process gas to a process chamber
摘要 In some embodiments, a gas distribution apparatus may include: a manifold having a gas inlet to receive a process gas from a fast gas exchange unit and a first gas outlet to provide the process gas to a first gas delivery zone; a plurality of flow restrictors fluidly coupled to one another in parallel and to the gas inlet, wherein each of the plurality of flow restrictors are configured to allow at least a portion of a total flow of a process gas through each of the plurality of flow restrictors; and a plurality of valves each coupled to respective ones of the plurality of flow restrictors, wherein the plurality of valves are configured to be selectively opened to allow the process gas to flow through selective ones of the plurality of flow restrictors to provide a desired percentage of a total flow of the process gas to the outlet.
申请公布号 US9488315(B2) 申请公布日期 2016.11.08
申请号 US201414207475 申请日期 2014.03.12
申请人 APPLIED MATERIALS, INC. 发明人 Nangoy Roy C.;Singh Saravjeet
分类号 F16K11/20;F17D1/00 主分类号 F16K11/20
代理机构 Moser Taboada 代理人 Moser Taboada ;Taboada Alan
主权项 1. A gas distribution apparatus, comprising: a manifold having a gas inlet to receive a process gas from a fast gas exchange unit, a first gas outlet to provide the process gas to a first gas delivery zone, and a second gas outlet to provide the process gas to a second gas delivery zone; a plurality of flow restrictors fluidly coupled to one another in parallel, and fluidly coupled to the gas inlet, wherein each of the plurality of flow restrictors are configured to allow at least a portion of a total flow of a process gas through each of the plurality of flow restrictors, wherein the plurality of flow restrictors comprises: a first set of flow restrictors fluidly coupled to one another in parallel and fluidly coupled only to the first gas outlet; anda second set of flow restrictors fluidly coupled to one another in parallel and fluidly coupled only to the second gas outlet; and a plurality of valves each coupled to respective ones of the plurality of flow restrictors, wherein the plurality of valves are configured to be selectively opened to allow the process gas to flow through selective ones of the plurality of flow restrictors to provide a desired percentage of a total flow of the process gas to the respective gas outlets.
地址 Santa Clara CA US