| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize high accurate image vibration measurement in an exposure apparatus. <P>SOLUTION: A space image measuring instruments 25A-25E are located on a tool wafer WT, and the tool wafer WT is located on a wafer holder WH in place of a wafer actually used in exposing, thereby carrying out the space image measurement for image vibration measurement at a position where the wafer exists when actually exposed. Thus, since a space image can be measured in the same stage condition to an actual exposure, the exact image vibration measurement can be performed in the same circumstance to an actual exposure. <P>COPYRIGHT: (C)2007,JPO&INPIT |
