Silicon crystal and device and method for manufacturing same

摘要

A germanium melt layer is interposed between starting polycrystalline silicon (18) and silicon crystal (20) to be grown. The starting polycrystalline silicon (18) is recrystallized through the germanium melt layer (19), so that the incorporated quantity of germanium is 0.005-0.01 atoms/cm<3>. A holding means (10) for holding the starting polycrystalline silicon (18) and the germanium melt layer (19) is provided, a heater (17) for heating it is provided on the outside of the holding means (10), and the starting polycrystalline silicon (18) is crystallized again through the germanium melt layer (19) to grow the silicon crystal (20). <IMAGE>