| 摘要 |
PROBLEM TO BE SOLVED: To provide a scanning device having a counter-balance device capable of establishing an approx. constant force system. SOLUTION: This ion implantation device includes an ion beam generator to generate a beam 15 of implantation ions fed into a process chamber 40. A scanning device is made movable in linear reciprocations along the first shaft relative to the process chamber 40. A wafer supporting structure having a longitudinal shaft is installed in the process chamber 40 in such a way that the axis is laid approx. horizontally. The end of the wafer supporting structure penetrates an opening in the wall and protrudes from the process chamber 40 to be fixed to the scanning device. At least one piston is attached to the end of the wafer supporting structure and accommodated slidably in at least one cylinder to make reciprocation along the second shaft which is parallel with the first shaft. The cylinder has a first end for opening so that the atmospheric pressure can act on the piston, and the intracylinder chamber closed with the piston is evacuated at the time of service.
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