| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress decrease in pattern resolution caused by an exposure light component incident not perpendicular to a photomask surface. <P>SOLUTION: A major surface of a transparent substrate 11 made of quartz, calcium fluoride or the like transparent to exposure light has recesses patterned by engraving the surface, and a light shielding film 12 is disposed in the recess. The area where the light shielding film 12 is formed serves as a light shielding section, while an area where a light shielding film is not formed serves as a light transmitting section. This significantly decreases the quantity of transmitted light of exposure light, which may be blocked by the light shielding film 12 if a conventional structure is used. <P>COPYRIGHT: (C)2009,JPO&INPIT |
