发明名称 POLYMERIZABLE COMPOSITION AND NEGATIVE TYPE RESIST USING THE SAME AND METHOD FOR FORMING IMAGE PATTERN USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a highly sensitive polymerizable composition which efficiently produces active radicals by the irradiation of energy rays, especially light, and in which a radical polymerizable compound can be polymerized in an extremely short time. <P>SOLUTION: This polymerizable composition contains a radical polymerization initiator represented by the general formula (1) (X is a condensed multi-cyclic hydrocarbon group; Y is a monovalent organic residue). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007211175(A) 申请公布日期 2007.08.23
申请号 JP20060033971 申请日期 2006.02.10
申请人 TOYO INK MFG CO LTD 发明人 TSUSHIMA MARE;SUGANO MAKI;MOROISHI YORIYUKI
分类号 C08F2/50;G03F7/031;H01L21/027;H05K3/00 主分类号 C08F2/50
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