| 摘要 |
A thin film deposition method is provided to improve a manufacturing yield by processing more than two thin films at different deposition temperatures in a single process module. A pre-process temperature at an initial phase of a deposition process is gradually or step-wisely increased to a post-process temperature or the pre-process temperature at the initial phase of the deposition process is gradually or step-wisely decreased to the post-process temperature. In the middle of the deposition process, the process temperature is changed. Deposition processes are simultaneously performed on more than two thin films in a single chamber at different deposition temperatures. The thin films are treated according to a CVD(Chemical Vapor Deposition) scheme.
|
