| 发明名称 |
A reactive ion etching process. |
| 摘要 |
<p>An etch gas consisting of SF6, a noble gas and a small percentage of a carbon-containing gas is used in a reactive ion etching process for etching a ceramic partially masked by an organic photoresist. </p> |
| 申请公布号 |
EP0206055(A2) |
申请公布日期 |
1986.12.30 |
| 申请号 |
EP19860107740 |
申请日期 |
1986.06.06 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BIANCHI, JACQUELINE KAY;GDULA, ROBERT ANTHONY;LANGE, DENNIS JOHN |
| 分类号 |
C04B41/53;C04B41/91;H01L21/311 |
主分类号 |
C04B41/53 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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