发明名称 STACK GAS TREATING DEVICE
摘要 <p>PURPOSE: To provide a miniaturized stack gas treating device advantageous in terms of cost and capable of being continuously operated for a long period. CONSTITUTION: A stack gas is introduced into a reaction vessel 1 from an inlet 1a and irradiated with X-rays from an X-ray generator 6. Consequently, electrons are generated from the NOX and SOX in the stack gas, various reactions are brought about, and the stack gas is converted into a powdery product. The impressed voltage of the X-rays is between several ten and several hundred KeV and about 1/10 of that in the case of electron beam irradiation, and hence the entire device is miniaturized. Meanwhile, since material penetrating power of X-rays is high, an irradiation window 2 is thickened, and the service life of the window 2 is prolonged.</p>
申请公布号 JPH08318128(A) 申请公布日期 1996.12.03
申请号 JP19950126791 申请日期 1995.05.25
申请人 TOSHIBA FA SYST ENG KK;TOSHIBA CORP 发明人 AMEMORI KIYOYUKI;YASUI SUKEYUKI
分类号 B01D53/60;B01D53/32;B01D53/74;(IPC1-7):B01D53/60 主分类号 B01D53/60
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