EVALUATING METHOD OF METAL CONTAMINATION IN WAFER CARRIER AND BOX

摘要

An evaluating method of metal contamination in wafer carrier and box is provided to directly elute metal materials from the carrying wafer structure and accurately analyze metal contamination of the carrying wafer structure. The evaluating method of metal contamination in wafer carrier and box comprises the elution step and the analysis step. The elution step is performed in order to apply the chemical solvent to the wafer carrier(10) and/or the box(20). The elution step is more performed to react the chemical solvent and wafer carrier and/or the box and to elute metal materials from the wafer carrier and/or the box. The analysis step is performed in order to collect the chemical solvent from the wafer carrier and/or the box. The analysis phase is more performed to collect the chemical solvent and analyze the extent of metal contamination of the wafer carrier and/or the box.