发明名称 PATTERN DEFECT INSPECTION METHOD, PATTERN DEFECT INSPECTING TEST PATTERN BOARD, PATTERN DEFECT INSPECTION DEVICE, PHOTO MASK MANUFACTURING METHOD, AND METHOD OF MANUFACTURING DISPLAY DEVICE SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To inspect the presence/absence of a micro defect caused in a repeat pattern. <P>SOLUTION: This pattern defect inspection method for inspecting a defect caused in a repeat pattern of a body to be inspected having a repeat pattern in which a unit pattern is periodically arrayed includes: a process of superposing a test pattern where a testing unit pattern is periodically arrayed and the repeat pattern to form a superposition pattern; a process of applying light at a predetermined incident angle to the superposition pattern; and a process of inspecting the presence/absence of a defect caused in the repeat pattern by observing diffracted light from the superposition pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007333590(A) 申请公布日期 2007.12.27
申请号 JP20060166409 申请日期 2006.06.15
申请人 HOYA CORP 发明人 YAMAGUCHI NOBORU
分类号 G01N21/956;G03F1/84;H01L21/027 主分类号 G01N21/956
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