发明名称 |
PATTERN DEFECT INSPECTION METHOD, PATTERN DEFECT INSPECTING TEST PATTERN BOARD, PATTERN DEFECT INSPECTION DEVICE, PHOTO MASK MANUFACTURING METHOD, AND METHOD OF MANUFACTURING DISPLAY DEVICE SUBSTRATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To inspect the presence/absence of a micro defect caused in a repeat pattern. <P>SOLUTION: This pattern defect inspection method for inspecting a defect caused in a repeat pattern of a body to be inspected having a repeat pattern in which a unit pattern is periodically arrayed includes: a process of superposing a test pattern where a testing unit pattern is periodically arrayed and the repeat pattern to form a superposition pattern; a process of applying light at a predetermined incident angle to the superposition pattern; and a process of inspecting the presence/absence of a defect caused in the repeat pattern by observing diffracted light from the superposition pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007333590(A) |
申请公布日期 |
2007.12.27 |
申请号 |
JP20060166409 |
申请日期 |
2006.06.15 |
申请人 |
HOYA CORP |
发明人 |
YAMAGUCHI NOBORU |
分类号 |
G01N21/956;G03F1/84;H01L21/027 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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