| 摘要 |
The present disclosure provides a wafer grinding device comprising: a chuck table to suction the wafer thereon, a grinding wheel to grind the wafer by a predetermined thickness, wherein the grinding wheel includes a grinding body, and grinding teeth arranged along and on a bottom outer periphery of the grinding body, wherein the grinding teeth are segmented; and a cooling unit at least partially extending along a region between a departure point of the grinding teeth from the wafer during rotation of the teeth, and a re-encounter point of the teeth with the wafer during rotation of the teeth, wherein the region extends along rotation path of the grinding teeth. |
| 主权项 |
1. A wafer grinding device comprising:
a chuck table configured to load a wafer thereon, to suction the wafer thereon, and to enable the suctioned wafer to be rotated in a predetermined speed; a spindle spaced from and above the chuck table at a predetermined distance, wherein the spindle is configured to descend and grind the suctioned wafer on the chuck table, wherein the spindle comprises:
a driver unit configured to enable a grinding wheel to be rotated at a predetermined speed and be descend by a predetermined distance to contact the wafer; andthe grinding wheel disposed coupled to the driver unit to grind the wafer by a predetermined thickness, wherein the grinding wheel includes a grinding body, and grinding teeth arranged along and on a bottom outer periphery of the grinding body, wherein the grinding teeth are segmented; and a cooling unit at least partially extending along a region between a departure point of the grinding teeth from the wafer during rotation of the teeth, and a re-encounter point of the teeth with the wafer during rotation of the teeth, wherein the region extends along rotation path of the grinding teeth. |
