发明名称 Wafer polishing device
摘要 In the wafer polishing device, a retainer ring can be attached and detached with ease. Under a retainer ring attaching part disposed on a head body, a retainer ring is attached with a snap ring. The snap ring is divided into two. An upper projection part and a lower projection part are formed on the inner periphery of the snap ring. The upper projection part is fitted to an upper groove formed on the outer periphery of the retainer ring attaching part, and the lower projection part is fitted to a lower groove formed on the outer periphery of the retainer ring. In attachment, the retainer ring is connected to the lower part of the retainer ring attaching part, and the snap ring is placed on the outer periphery of the joint.
申请公布号 US6485358(B2) 申请公布日期 2002.11.26
申请号 US20010977311 申请日期 2001.10.16
申请人 TOKYO SEIMITSU CO., LTD. 发明人 NUMOTO MINORU;HONMA SHIGEYUKI
分类号 B24B37/04;B24B37/30;B24B37/32;B24B41/06;H01L21/304;(IPC1-7):B24B7/22 主分类号 B24B37/04
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