| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To extend a transmissivity control range without miniaturizing a grating pattern in an exposure mask for exposing a three-dimensional shape. <P>SOLUTION: The exposure mask for forming a three-dimensional shape comprises: a transparent substrate 10 transmitting exposure light; a first grating part 100 comprising a light-blocking pattern 11 blocking the exposure light, disposed in a given pitch on the substrate 10 with the size of the light-blocking pattern 11 gradually varied; and a second grating part 200 comprising a halftone pattern 12 partially transmitting the exposure light, disposed in a given pitch on the substrate 10 with the size of the halftone pattern 12 gradually varied. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
