发明名称 MASK FRAME ASSEMBLY FOR THIN LAYER DEPOSITION, A METHOD OF MANUFACTURING THE SAME, AND A METHOD OF MANUFACTURING DISPLAY APPARATUS BY USING A MASK FRAME ASSEMBLY
摘要 A mask frame assembly including a frame including a first opening, a first mask including second openings that each has an area smaller than the first opening and a first surface having portions of the first surface connected to the frame. The mask frame assembly includes second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular. The second masks include pattern parts having a shape corresponding to the second openings. The pattern parts each include pattern holes configured to allow a deposition material to pass through. The second masks include a rib part disposed between the pattern parts. The rib part includes dummy holes each having an area greater than each of the pattern holes. The first mask is configured to block the deposition material passing through the dummy holes.
申请公布号 US2016312354(A1) 申请公布日期 2016.10.27
申请号 US201514974356 申请日期 2015.12.18
申请人 Samsung Display Co., Ltd. 发明人 KO Junhyeuk;LEE Sangshin
分类号 C23C14/04;H01L51/00;H01L51/56 主分类号 C23C14/04
代理机构 代理人
主权项 1. A mask frame assembly, comprising: a frame comprising a first opening; a first mask comprising: second openings that each have an area smaller than the first opening; anda first surface having portions of the first surface connected to the frame; and second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular, the second masks comprising: pattern parts having a shape corresponding to the second openings, the pattern parts each comprising pattern holes configured to allow a deposition material to pass through; anda rib part disposed between the pattern parts, the rib part comprises dummy holes each having an area greater than each of the pattern holes, wherein the first mask is configured to block the deposition material passing through the is dummy hole.
地址 Yongin-si KR