发明名称 |
DUAL-SIDE IMPRINTING LITHOGRAPHY SYSTEM |
摘要 |
Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays.
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申请公布号 |
US2009061035(A1) |
申请公布日期 |
2009.03.05 |
申请号 |
US20080035702 |
申请日期 |
2008.02.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO EUN-HYOUNG;CHOA SUNG-HOON;SOHN JIN-SEUNG;LEE DU-HYUN |
分类号 |
B29C35/08 |
主分类号 |
B29C35/08 |
代理机构 |
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代理人 |
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主权项 |
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