| 发明名称 |
MANUFACTURING METHOD FOR POLYURETHANE POLISHING PAD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a polyurethane polishing pad of a large area for rough finishing excellent in thickness accuracy from a block for a soft polyurethane polishing member capable of being sliced. <P>SOLUTION: After a block for a soft polyurethane polishing member having JIS-A hardness of 90 or lower at a temperature of 25°C is sliced, the sliced block is impregnated with organic polyisocyanate at 200 mPas or lower in viscosity during impregnation and then curing is performed for obtaining high hardness. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2008126363(A) |
申请公布日期 |
2008.06.05 |
| 申请号 |
JP20060313736 |
申请日期 |
2006.11.21 |
| 申请人 |
NIPPON POLYURETHANE IND CO LTD |
发明人 |
NOMURA KOJI;NAKAJIMA YUHEI |
| 分类号 |
B24B37/20;H01L21/304 |
主分类号 |
B24B37/20 |
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