发明名称 PATTERNING METHOD AND METHOD FOR FABRICATING ELECTRONIC ELEMENT
摘要 A patterning method comprising a first step for forming a conductive film (D) by coating a first plate (10) with a liquid composition and for heating the first plate (10); a second step for forming a conductive pattern (D') on the first plate (10) by pressing a second plate (20) having an irregular pattern shape on the surface against the surface of the first plate (10) whereupon the conductive film (D) is formed and by transferring the unnecessary pattern of the conductive film (D) to the top surface of the protrusions (20a) of the second plate (20) to remove the unnecessary pattern; and a third step for transferring the conductive pattern (D') to the surface of a substrate (30) whereupon the pattern is to be transferred, by pressing the surface of the first plate (10), on which the conductive pattern (D') is formed, against the surface of the substrate (30). The liquid composition contains a solvent exhibiting vapor pressure of 133 Pa or below at the surface temperature of the heated first plate (10). A method for fabricating an electronic element is also provided. A minute and precise pattern is stably formed with good reproducibility by stabilizing the state of the liquid composition coating.
申请公布号 KR20090127147(A) 申请公布日期 2009.12.09
申请号 KR20097020341 申请日期 2007.12.21
申请人 SONY CORPORATION 发明人 FUKUDA TOSHIO;NOMOTO AKIHIRO
分类号 H01L21/288;H01L21/3205;H01L21/336;H01L21/786 主分类号 H01L21/288
代理机构 代理人
主权项
地址